The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
Oct. 30, 2020
Applicant:
Sumitomo Rubber Industries, Ltd., Kobe, JP;
Inventors:
Mutsuki Sugimoto, Kobe, JP;
Takuro Akasaka, Kobe, JP;
Assignee:
SUMITOMO RUBBER INDUSTRIES, LTD., Kobe, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 279/02 (2006.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); B29C 64/124 (2017.01); C08F 255/10 (2006.01); B33Y 80/00 (2015.01); B29K 33/00 (2006.01);
U.S. Cl.
CPC ...
C08F 279/02 (2013.01); B29C 64/124 (2017.08); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); C08F 255/10 (2013.01); B29K 2033/12 (2013.01); B33Y 80/00 (2014.12);
Abstract
An object of the present invention is to provide a novel polymer composition for stereolithography that is capable of suitably providing an elastic molded product by stereolithography. A polymer composition for stereolithography containing a liquid polymer and a monomer, the polymer composition for stereolithography having a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec.