The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Nov. 15, 2019
Applicant:

Agc Inc., Chiyoda-ku, JP;

Inventors:

Shinya Higuchi, Chiyoda-ku, JP;

Masahiro Takazawa, Chiyoda-ku, JP;

Takehiro Kose, Chiyoda-ku, JP;

Assignee:

AGC Inc., Chiyoda-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 214/18 (2006.01); H01B 3/44 (2006.01); C08F 214/26 (2006.01); H01B 7/02 (2006.01);
U.S. Cl.
CPC ...
C08F 214/182 (2013.01); C08F 214/262 (2013.01); H01B 3/445 (2013.01); H01B 7/02 (2013.01);
Abstract

A modified polytetrafluoroethylene which can be formed under a low extrusion pressure and with which changes of the extrusion pressure are suppressed, even in paste extrusion at a high RR ratio, and its production method. The modified polytetrafluoroethylene having units based on tetrafluoroethylene, 0.020 to 0.040 mass % of units based on a monomer represented by the following formula (1), and 0.003 to 0.080 mass % of units based on a monomer represented by the following formula (2), each based on all units of the modified polytetrafluoroethylene. The monomers of formulae (1) and (2) are represented by: CH═CH—CF(1), wherein n is from 2 to 6; and CF═CFO(LO)Rf (2), wherein L is a perfluoroalkylene group, Rf is a perfluoroalkyl group, and m is an integer of from 0 to 4.


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