The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
Jul. 17, 2019
Technische Universität München, Munich, DE;
Aras Kartouzian, Munich, DE;
Ulrich Heiz, Munich, DE;
Farinaz Mortaheb, Munich, DE;
Katrin Oberhofer, Eching, DE;
Johann Riemensberger, Eching, DE;
Hristo Iglev, Garching, DE;
Reinhard Kienberger, Garching, DE;
TECHNISCHE UNIVERSITÄT MÜNCHEN, Munich, DE;
Abstract
According to the present invention there is provided a method for enantiomeric enrichment of a mixture of two enantiomers of a chiral compound, the method comprises the application of the mixture of two enantiomers of a chiral compound onto a surface of a support material for producing a coated support, the determination a first value of an optical activity (OA) of the coated support, the irradiation of the coated support with a light beam having an intensity at least higher than a desorption threshold of one of the enantiomers from the coated support, wherein, if the support material is achiral, the light beam is circularly polarized and, if the support material is chiral, the light beam is unpolarized, linearly polarized or circularly polarized, and the determination of a second value of the optical activity (OA) of the coated support after said irradiation, wherein the second value of the optical activity (OA) differs from the first value of the optical activity (OA).