The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Mar. 27, 2018
Applicant:

Dsm Ip Assets B.v., Heerlen, NL;

Inventors:

Marcel Simor, Rijswijk, NL;

Ales Fiala, Rotterdam, NL;

Harm van der Werff, Echt, NL;

Assignee:

DSM IP ASSETS B.V., Heerlen, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); B29C 59/14 (2006.01); C08J 7/18 (2006.01); D06M 14/18 (2006.01); H05H 1/24 (2006.01); D06M 14/26 (2006.01);
U.S. Cl.
CPC ...
B05D 1/62 (2013.01); B29C 59/142 (2013.01); C08J 7/18 (2013.01); D06M 14/18 (2013.01); D06M 14/26 (2013.01); H05H 1/2406 (2013.01); B29C 2059/145 (2013.01); H05H 1/2431 (2021.05);
Abstract

The invention relates to a method for treating an elongated object using a plasma process. The method comprises the steps of providing an elongated object in a planar electrode structure, and applying potential differences between electrodes of an electrode structure to generate the plasma process. Further, the method comprises at least partially surrounding the elongated object by a unitary section of the guiding structure, the electrode structure being associated with the unitary section.


Find Patent Forward Citations

Loading…