The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Aug. 29, 2018
Applicants:

Northeastern University, Boston, MA (US);

Boston Children's Hospital, Boston, MA (US);

Inventors:

Hui Fang, Brookline, MA (US);

Yi Qiang, West Roxbury, MA (US);

Kyung Jin Seo, Boston, MA (US);

Pietro Artoni, Boston, MA (US);

Michela Fagiolini, Newton, MA (US);

Assignees:

NORTHEASTERN UNIVERSITY, Boston, MA (US);

BOSTON CHILDREN'S HOSPITAL, Boston, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 5/291 (2021.01); H01B 1/02 (2006.01); H01B 13/00 (2006.01); H01B 1/08 (2006.01); H01B 1/12 (2006.01);
U.S. Cl.
CPC ...
A61B 5/291 (2021.01); H01B 1/02 (2013.01); H01B 13/0036 (2013.01); A61B 2562/0214 (2013.01); A61B 2562/0285 (2013.01); A61B 2562/04 (2013.01); A61B 2562/125 (2013.01); A61B 2562/182 (2013.01); H01B 1/08 (2013.01); H01B 1/124 (2013.01);
Abstract

Techniques and apparatus for bilayer nanomesh techniques for transparent and/or stretchable electrophysiological microelectrodes. The bilayer may include of a metal layer and a low impedance coating both in a nanomesh form. Bilayer nanomesh structures according to some embodiments may provide high transparency, great flexibility, large stretchability, while providing improved electrochemical performance compared with conventional systems. Other embodiments are described.


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