The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Jan. 28, 2016
Applicant:

Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;

Inventor:

Zhenghao Gan, Shanghai, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 27/06 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0623 (2013.01); H01L 27/027 (2013.01); H01L 29/7835 (2013.01);
Abstract

An electrostatic discharge protection structure includes a laterally diffused metal oxide semiconductor (LDMOS) device. The LDMOS device includes an embedded bipolar junction transistor. A gate, a source, a buried layer lead-out area, and a substrate lead-out area of the LDMOS device are grounded. A drain and a body region lead-out area of the LDMOS device are electrically connected to a pad input/output terminal. In an embodiment, the embedded bipolar junction transistor includes a PNP transistor operative to transmit a reverse electrostatic discharge current. An N+ drain, a gate, an N+ source, and a P+ substrate lead-out area form a grounded-gate NMOS (GGNMOS) operative to transmit a forward electrostatic discharge current.


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