The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Apr. 17, 2020
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Pin-yu Chen, White Plain, NY (US);

Sijia Liu, Somerville, MA (US);

Shiyu Chang, Elmsford, NY (US);

Payel Das, Yorktown Heights, NY (US);

Minhao Cheng, Los Angeles, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01); G06F 17/18 (2006.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); G06F 17/18 (2013.01);
Abstract

Techniques for training robust machine learning models for adversarial input data. Training data for a machine learning (ML) model is received. The training data includes a plurality of labels for data elements. First modified training data is generated by modifying one or more of the plurality of labels in the training data using parameterized label smoothing with a first optimization parameter. The ML model is trained using the first modified training data. The training includes updating a first one or more model weights in the ML model, and generating a second optimization parameter suitable for use in future parameterized label smoothing for future training of the ML model


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