The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Jun. 19, 2017
Applicant:

The Fourth Paradigm (Beijing) Tech CO Ltd, Beijing, CN;

Inventors:

Yuanfei Luo, Beijing, CN;

Weiwei Tu, Beijing, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01); G06F 17/18 (2006.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); G06F 17/18 (2013.01);
Abstract

Provided are a feature processing method and feature processing system for machine learning. The feature processing method includes: (A) acquiring a data record, wherein the data record comprises at least one piece of attribute information; (B) for each of the continuous features generated based on at least a some of the attribute information in the at least one piece of attribute information, executing a basic binning operation and at least one additional operation to generate a basic binning feature and at least one additional feature corresponding to each of the continuous features; and (C) generating a machine learning sample at least comprising the generated basic binning feature and at least one additional feature. By means of the above-mentioned method, a plurality of features comprising the binning feature and corresponding to the continuous features can be acquired, so as to make the features constituting the machine learning sample more effective, so as to improve the effect of a machine learning model.


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