The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Mar. 28, 2018
Applicant:

Jx Nippon Mining & Metals Corporation, Tokyo, JP;

Inventors:

Hiroshi Takamura, Ibaraki, JP;

Ryosuke Sakashita, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); B23K 35/26 (2006.01); B23K 20/10 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3407 (2013.01); B23K 35/26 (2013.01); B23K 35/262 (2013.01); H01J 37/3426 (2013.01); H01J 37/3435 (2013.01); B23K 20/10 (2013.01);
Abstract

A sputtering target-backing plate assembly in which a Si sputtering target is bonded to a backing plate by way of a brazing material, wherein the brazing material has a melting point of 200° C. or higher and a bonding strength of 0.16 kgf/cmor higher. An object is to provide a sputtering target-backing plate assembly in which a Si sputtering target is bonded to a backing plate by way of a brazing material, wherein the sputtering target-backing plate assembly has a high bonding strength and is free from separation even under high temperature sputtering conditions such as during high power sputtering.


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