The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Jun. 26, 2020
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Min Sik Mun, Daejeon, KR;

No Ma Kim, Daejeon, KR;

Da Won Chai, Daejeon, KR;

Ho Young Lee, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08C 19/22 (2006.01); C07F 7/18 (2006.01); C08C 19/25 (2006.01); C08C 19/20 (2006.01); C08C 19/44 (2006.01); C08L 15/00 (2006.01); C08F 236/10 (2006.01); C08F 236/06 (2006.01); C08F 2/06 (2006.01); C08F 236/14 (2006.01); C08K 3/22 (2006.01);
U.S. Cl.
CPC ...
C07F 7/1804 (2013.01); C07F 7/1892 (2013.01); C08C 19/20 (2013.01); C08C 19/22 (2013.01); C08C 19/25 (2013.01); C08C 19/44 (2013.01); C08F 2/06 (2013.01); C08F 236/06 (2013.01); C08F 236/10 (2013.01); C08F 236/14 (2013.01); C08L 15/00 (2013.01); C08F 2800/20 (2013.01); C08K 2003/2296 (2013.01);
Abstract

The present disclosure relates to a modifier, and more particularly, to a modifier including a compound represented by Formula 1, and a method of preparing the same. Such modifier exhibits excellent dispersibility via hydrogen bonding with an inorganic filler when mixed therewith. The present disclosure also relates to a modified conjugated diene-based polymer and a method of preparing the modified conjugated diene-based polymer by using the modifier. The resulted modified conjugated diene-based polymer exhibits excellent processability, high tensile strength, high wear resistance, low rolling resistance, and high wet skid resistance.


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