The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2022
Filed:
May. 16, 2019
Canon Kabushiki Kaisha, Tokyo, JP;
Atsushi Kimura, Saitama, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint method for forming a pattern of an imprint material on a substrate includes irradiating the imprint material with light to increase a viscosity of the imprint material on the substrate with a mold and the imprint material being in contact with each other, aligning the substrate and the mold with each other while changing and increasing a control gain to be used in a controller, which is configured to control relative positions of the mold and the substrate so as to reduce a displacement based on a result of detection of the displacement between the substrate and the mold, in such a manner that the control gain increases with the mold and the imprint material being in contact with each other, and curing the imprint material by irradiating the imprint material with light.