The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

May. 29, 2020
Applicant:

Kubota Corporation, Osaka, JP;

Inventors:

Yasunobu Okajima, Amagasaki, JP;

Yuki Kawashima, Amagasaki, JP;

Yuji Otsuka, Amagasaki, JP;

Yukako Morita, Amagasaki, JP;

Ken Tanaka, Amagasaki, JP;

Assignee:

KUBOTA CORPORATION, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 65/06 (2006.01); C02F 1/44 (2006.01); B01D 61/58 (2006.01);
U.S. Cl.
CPC ...
B01D 65/06 (2013.01); C02F 1/44 (2013.01); B01D 61/58 (2013.01); B01D 2321/162 (2013.01); C02F 2209/03 (2013.01); C02F 2303/16 (2013.01);
Abstract

Provided is a method for cleaning a filtration membrane provided in a membrane filtration device that is immersed in a liquid to be treated and performs solid-liquid separation on the liquid to be treated. When a transmembrane pressure difference exceeds a first predetermined pressure difference P, a first cleaning step Wfor cleaning a filtration membrane is performed using a first chemical solution; when the transmembrane pressure difference immediately after performing the first cleaning step Wexceeds a second predetermined pressure difference Pthat is lower than the first predetermined pressure difference, a second cleaning step Wfor cleaning the filtration membrane is performed using a second chemical solution having a concentration higher than the first chemical solution; and when the second cleaning step Wis performed, the concentration of the second chemical solution and/or the cleaning time is changed according to the temperature of the liquid to be treated.


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