The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2022

Filed:

Sep. 16, 2020
Applicant:

Ethicon Llc, Guaynabo, PR (US);

Inventors:

Mark S. Zeiner, Mason, OH (US);

Heather Strang, West Chester, OH (US);

Pamela M. Ridgley, Lebanon, OH (US);

Christopher A. Denzinger, Cincinnati, OH (US);

Christopher Q. Seow, Cincinnati, OH (US);

Michael J. Vendely, Lebanon, OH (US);

Gregory J. Bakos, Mason, OH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 17/072 (2006.01); A61B 17/068 (2006.01); A61B 17/28 (2006.01); A61B 17/00 (2006.01);
U.S. Cl.
CPC ...
A61B 17/0686 (2013.01); A61B 17/072 (2013.01); A61B 17/07207 (2013.01); A61B 17/07292 (2013.01); A61B 17/282 (2013.01); A61B 17/068 (2013.01); A61B 2017/00398 (2013.01); A61B 2017/07214 (2013.01); A61B 2017/07257 (2013.01); A61B 2017/07271 (2013.01); A61B 2017/2825 (2013.01);
Abstract

An apparatus includes a platform, an adjunct material, and an engagement feature. The platform includes an upper support and a lower support. The adjunct material is positioned on the upper support or the lower support. The upper support is configured to move relative to the lower support to apply the adjunct material to a jaw of an end effector incorporated into a surgical stapler. The engagement feature is configured to interact with a predetermined portion of the end effector to permit movement of the upper support relative to the lower support and thereby apply the adjunct material to the jaw of the end effector. The engagement feature is further configured to inhibit movement of the upper support relative to the lower support when the engagement feature is disengaged from the predetermined portion of the end effector.


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