The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Aug. 26, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Dzung Phan, Ossining, NY (US);

Robert Baseman, Brewster, NY (US);

Nam H. Nguyen, Pleasantville, NY (US);

Fateh Tipu, Wappingers Falls, NY (US);

Ramachandran Muralidhar, Mahopac, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G06N 20/00 (2019.01); G06N 7/00 (2006.01); G01R 31/26 (2020.01);
U.S. Cl.
CPC ...
H01L 22/14 (2013.01); G01R 31/2601 (2013.01); G06N 7/005 (2013.01); G06N 20/00 (2019.01);
Abstract

Anomaly detection and remedial recommendation techniques for improving the quality and yield of microelectronic products are provided. In one aspect, a method for quality and yield improvement via anomaly detection includes: collecting time series sensor data during individual steps of a semiconductor manufacturing process; calculating anomaly scores for each of the individual steps using a predictive model; and implementing changes to the semiconductor manufacturing process based on the anomaly scores. A system for quality and yield improvement via anomaly detection is also provided.


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