The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Mar. 01, 2018
Applicant:

Suss Microtec Photomask Equipment Gmbh & Co. KG, Sternenfels, DE;

Inventors:

Peter Dress, Sternenfels, DE;

Uwe Dietze, Sternenfels, DE;

Peter Grabitz, Sternenfels, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/10 (2006.01); G03F 1/82 (2012.01); H01L 21/67 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B08B 3/10 (2013.01); B08B 7/0057 (2013.01); G03F 1/82 (2013.01); H01L 21/67115 (2013.01);
Abstract

An apparatus includes a housing having an elongated chamber, an inlet opening extending into the chamber, and a slit shaped outlet opening. A tube element extends in a longitudinal direction through the chamber and is at least partially transparent to UV radiation. The tube element is arranged in the chamber such that a flow space is formed between the tube element and the wall of the chamber. At least one UV-radiation source in the tube element is arranged to emit UV-radiation in the direction of the flow space and through the outlet opening out of the housing to generate radicals in the liquid and bring the radicals to the substrate surface. Means are provided for adjusting the radiation exiting the outlet opening through the tube element such that the intensity of the radiation increases towards the longitudinal center plane of the chamber.


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