The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Aug. 01, 2019
Applicant:

Siemens Ltd., China, Beijing, CN;

Inventors:

Hai Feng Wang, Shanghai, CN;

Wen Chao Zou, Shanghai, CN;

Shao Tu Jia, Fuxin, CN;

Assignee:

SIEMENS LTD., CHINA, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/00 (2006.01);
U.S. Cl.
CPC ...
G06T 17/00 (2013.01); G06T 2210/56 (2013.01);
Abstract

A point cloud model reconstruction method, apparatus, and system are disclosed. In an embodiment, the method includes randomly selecting four non-coplanar reconstruction points in a point cloud model; iteratively selecting other reconstruction points successively until a reconstruction condition is met, and reconstructing the point cloud model based on all reconstruction points. A reduction degree of a reconstructed point cloud model is: Reward=−k·(PointNum−4)+g·VolRate, where PointNum represents a number of current selected reconstruction points, VolRate represents a ratio of a volume of a solid shape, k represents a proportion of the number of the selected points, and g represents a proportion of the volume ratio. The reconstruction method further includes adjusting a ratio of g to k based on user requirements to adjust the reconstruction condition. The mechanism provided in an embodiment can improve resolution of a reconstructed point cloud model and control quality of points in the reconstructed point cloud model.


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