The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Feb. 28, 2020
Applicant:

Cnh Industrial America Llc, New Holland, PA (US);

Inventors:

Christopher Barrick, Morton, IL (US);

Robert A. Zemenchik, Fair Oaks, CA (US);

John H. Posselius, Ephrata, PA (US);

Assignee:

CNH Industrial America LLC, New Holland, PA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); A01B 79/00 (2006.01); G06V 20/10 (2022.01); B64C 39/02 (2006.01); G06V 20/68 (2022.01); A01C 21/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); A01B 79/005 (2013.01); A01C 21/007 (2013.01); G06V 20/188 (2022.01); B64C 39/024 (2013.01); G06T 2207/30188 (2013.01); G06V 20/68 (2022.01);
Abstract

A method for determining residue coverage within a field may include receiving, with one or more computing devices, first and second images of the field. The first image may depict a portion of the field at a first time during a crop-growing period and the second image may depict the portion of the field at a second time during the crop-growing period, with the first and second times being different. Furthermore, the method may include generating, with the one or more computing devices, an estimated residue coverage map for the field based on the received first and second images. Additionally, the method may include generating, with the one or more computing devices, a prescription map for the field based on the estimated residue coverage map.


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