The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

May. 20, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Vaibhav Murlidhar Kulkarni, Bangalore, IN;

Rakhi S. Arora, Bangalore, IN;

Padmanabhan Krishnan, Bangalore, IN;

Gopikrishnan Varadarajulu, Bangalore, IN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01); G06N 5/02 (2006.01); H04L 9/08 (2006.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); G06N 5/02 (2013.01); H04L 9/085 (2013.01); H04L 2209/46 (2013.01);
Abstract

In a secure multi-party computation (sMPC) system, a super mask is constructed using a set of masks corresponding to a set of data contributors. Each data contributor uses a corresponding different mask to obfuscate the data of the data contributor. a first scaled masked data is formed by applying a first scale factor to first masked data of the first data contributor, the scale factor being computed specifically for the first data contributor from the super mask. A union is constructed of all scaled masked data from all data contributors, including the first scaled masked data. A machine learning (ML) model is trained using the union as training data, where the union continues to keep obfuscated the differently masked data from the different data contributors. The training produces a trained ML model usable in the sMPC with the set of data contributors.


Find Patent Forward Citations

Loading…