The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Oct. 10, 2019
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Seonyoung Jegal, Daejeon, KR;

Byoung Hyoun Kim, Daejeon, KR;

Dong Hyun Kim, Daejeon, KR;

Yura Lee, Daejeon, KR;

Hyun Sik You, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 30/12 (2006.01); G01N 30/86 (2006.01); G01N 30/72 (2006.01);
U.S. Cl.
CPC ...
G01N 30/12 (2013.01); G01N 30/7206 (2013.01); G01N 30/8631 (2013.01); G01N 2030/125 (2013.01);
Abstract

A method for securing qualitative and quantitative information of a high molecular weight additive in a polymer resin sample is disclosed herein. In some embodiments, the method includes separating a fraction of a polymer resin sample using size exclusion chromatography (SEC), wherein the fraction corresponding to a high molecular weight additive, pyrolyzing the fraction in a pyrolysis-gas chromatography/mass spectrometer (Py-GC/MS) to obtain a mass spectrum of the pyrolyzed fraction; identifying a structure of the high molecular weight additive by comparing m/z values for fragment peaks in the mass spectrum to m/z values for fragment peaks in a mass spectrum of a standard, and determining the amount of the high molecular weight additive in the polymer resin sample, relative to the total weight of the polymer resin sample by comparing a sum of areas of the fragment peaks to a calibration line of the standard.


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