The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2022
Filed:
Jan. 22, 2018
Skyverse Technology Co., Ltd., Guangdong, CN;
Lu Chen, Shenzhen, CN;
Skyverse Technology Co., Ltd., Shenzhen, CN;
Abstract
The disclosure provides a metrology system, comprising: a lens assembly configured to receive reflected light from a sample surface and split the reflected light into at least a first reflected beam and a second reflected beam; an imaging unit configured to receive the first reflected beam to generate imaging data of the sample surface, wherein the imaging data includes distribution information of at least one detection area located in at least one detection region of the sample; a film thickness measuring unit configured to receive the second reflected beam, and obtain film thickness data of a specified object in the detection area; and a processing unit, communicatively coupled to the imaging unit and the film thickness measuring unit, and configured to: determine a detection path of the at least one detection area based on the distribution information, and cause the film thickness measuring unit to obtain film thickness data of the detection area based on the detection path, wherein, on an optical path, spectrum receiving surface of the imaging unit is configured to be optically conjugate with the sample surface, and a spectrum receiving surface of the film thickness measuring unit are configured to be optically conjugate with the sample surface.