The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2022
Filed:
Jun. 08, 2020
Applicant:
City University of Hong Kong, Kowloon, HK;
Inventors:
Chunyi Zhi, New Territories, HK;
Qi Yang, Kowloon, HK;
Ying Guo, Kowloon, HK;
Zijie Tang, New Territories, HK;
Assignee:
City University of Hong Kong, Kowloon, HK;
Primary Examiner:
Int. Cl.
CPC ...
C01B 32/05 (2017.01); B01J 21/18 (2006.01);
U.S. Cl.
CPC ...
C01B 32/05 (2017.08); B01J 21/18 (2013.01); C01P 2002/20 (2013.01);
Abstract
A method of preparing graphdiyne-based material and a substrate for use in such material preparation process. The method includes the steps of: disposing an alkynye-based monomer on a substrate; maintaining a planar structure of each of a plurality of molecules of the monomer on a surface of the substrate; and initiating polymerization of the monomer on the substrate to synthesize a two-dimensional crystalline layer of the graphdiyne-based material on the substrate.