The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Jan. 25, 2019
Applicant:

Trumpf Laser Gmbh, Schramberg, DE;

Inventors:

Martin Huonker, Dietingen, DE;

Christoph Tillkorn, Villingendorf, DE;

Stefan Dorer, Villingen, GH;

Assignee:

TRUMPF LASER GMBH, Schramberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/064 (2014.01); B23K 26/06 (2014.01); B23K 26/073 (2006.01); B23K 26/08 (2014.01); G02B 27/09 (2006.01); B23K 26/352 (2014.01); B23K 26/00 (2014.01); G02B 27/14 (2006.01); G02B 19/00 (2006.01); B23K 103/00 (2006.01); H01S 3/00 (2006.01); B23K 101/40 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0643 (2013.01); B23K 26/0006 (2013.01); B23K 26/0648 (2013.01); B23K 26/0652 (2013.01); B23K 26/0738 (2013.01); B23K 26/08 (2013.01); B23K 26/352 (2015.10); G02B 19/0028 (2013.01); G02B 19/0052 (2013.01); G02B 27/0927 (2013.01); G02B 27/0972 (2013.01); G02B 27/14 (2013.01); B23K 2101/40 (2018.08); B23K 2103/54 (2018.08); B23K 2103/56 (2018.08); H01S 3/005 (2013.01);
Abstract

A laser system is configured for providing a laser line (L) in a working plane (WP) for line illumination of an object. The laser line (L) extends in a first direction (x) over a significant length and in a second direction (y) over a small extent. The laser system includes a laser source for providing a laser beam as basis for an elongated input laser beam propagating along a propagation direction (z), and a homogenization and focusing unit for homogenizing the elongated laser beam to form the laser line (L). The laser system is, for example, suitable for providing a laser line (L) that can be stitched to another laser line (L') of another laser system.


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