The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Apr. 12, 2019
Applicant:

Centrillion Technology Holdings Corporation, Grand Cayman, KY;

Inventors:

Maurizio Righini, Palo Alto, CA (US);

Wei Zhou, Saratoga, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 19/00 (2006.01); C40B 40/06 (2006.01); C40B 50/18 (2006.01);
U.S. Cl.
CPC ...
B01J 19/0046 (2013.01); C40B 40/06 (2013.01); C40B 50/18 (2013.01); B01J 2219/00596 (2013.01); B01J 2219/00722 (2013.01);
Abstract

The present disclosure relates to processes for suspending stretched nucleic acids over surface features. These processes can be used to prepare stretched nucleic acids that are more active in enzymatic reactions and other reactions than those laid down on a flat surface. These processes can be achieved by using a photoresist layer on top of a substrate, stretch a nucleic acid on top of the surface, and then remove part of the photoresist to form surface features that suspend the stretched nucleic acid. Furthermore, the formation of a hydrogel layer over the stretched nucleic acid and the surface features can transfer the stretched nucleic acid to the hydrogel for further reactions, including enzymatic reactions.


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