The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Aug. 13, 2020
Seoul National University R&db Foundation, Seoul, KR;
Min Soo Kim, Seoul, KR;
Sung Hoon Choi, Seoul, KR;
Dong Gyun Kang, Seoul, KR;
In Seop Lim, Seoul, KR;
SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION, Seoul, KR;
Abstract
A plurality of channel elements provided in a bipolar plate have different widths depending on positions, so that the velocity of flow of the fluid increases from an inlet toward an outlet of the bipolar plate and water generated when the fluid is condensed on the downstream side of the bipolar plate can be discharged more smoothly. In addition, a plurality of channel elements have different contact angles depending on positions of the plurality of channel elements so that the contact angle increases toward the outlet side of the bipolar plate. Thus, the reaction gas can be more concentrated on the surface of a gas diffusion layer. Even if the concentration of the reaction gas is reduced at the outlet side of the bipolar plate, the diffusion of the reaction gas is well performed, so that performance reduction can be prevented.