The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2022

Filed:

Dec. 07, 2020
Applicant:

Adobe Inc., San Jose, CA (US);

Inventors:

Nirmal Kumawat, Rajsamand, IN;

Praveen Kumar Dhanuka, Howrah, IN;

Assignee:

Adobe Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 11/20 (2006.01); G06T 3/00 (2006.01); G06F 40/109 (2020.01);
U.S. Cl.
CPC ...
G06T 11/203 (2013.01); G06F 40/109 (2020.01); G06T 3/0093 (2013.01);
Abstract

In implementations of glyph weight modification, a glyph modification system represents an outline of an unmodified glyph as segments having start points and endpoints. The segments have directions based on the start points and the endpoints such that an endpoint of a segment is a start point of another segment. The system identifies features of the unmodified glyph based on the segment directions. A property of the unmodified glyph can be modified by changing coordinates of points of the segments based on the identified features. The glyph modification system generates a modified glyph having the modified property using the points of the segments with the changed coordinates.


Find Patent Forward Citations

Kumawat, Nirmal. (2022). Glyph weight modification (U.S. Patent No. 11403794). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11403794

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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