The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Sep. 24, 2020
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Hiroyuki Yamazaki, Joetsu, JP;
Masao Ando, Joetsu, JP;
Daiyu Okafuji, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); G03F 7/00 (2006.01); C03C 3/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); C03C 3/06 (2013.01); C03C 15/00 (2013.01); C03C 2201/02 (2013.01); Y10T 428/24479 (2015.01);
Abstract
In an imprint mold-forming synthetic quartz glass substrate () of rectangular shape having dimensions Land Lwith L≥L, a circular region is delineated on the substrate back surface by a circle of radius R with L−2R≥10 mm. When approximation analysis is performed from the 1st to 8th term in the Zernike polynomials on the circular region, a coefficient of the 4th term is equal to or greater than −(2R/100,000×1) μm.