The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2022

Filed:

Dec. 17, 2018
Applicant:

Medlumics S.l., Madrid, ES;

Inventors:
Assignee:

Medlumics S.L., Madrid, ES;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/00 (2006.01); G02B 6/136 (2006.01); B81C 1/00 (2006.01); G02B 6/12 (2006.01);
U.S. Cl.
CPC ...
G02B 6/136 (2013.01); B81C 1/00904 (2013.01); B81C 1/00896 (2013.01); G02B 2006/12061 (2013.01); G02B 2006/12069 (2013.01); G02B 2006/12176 (2013.01);
Abstract

A fabrication method includes arranging a plurality of dice on a substrate and performing a first etching process that etches a first layer of the substrate at a boundary between adjacent dice on the substrate. The etching forms facets of one or more waveguides that are defined within the first layer, and the etching leaves a portion of the first layer in the boundary between the adjacent dice. The method continues with a second etching process that etches the portion of the first layer and a second layer beneath the portion of the first layer, the second etching process forming a trench in the boundary where the second layer has a different material than the first layer. The method also includes separating the dice from one another along the trench.


Find Patent Forward Citations

Loading…