The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Feb. 10, 2019
Bar-ilan University, Ramat Gan, IL;
Sharon Shwartz, Kiryat Ono, IL;
Aviad Schori, Palo Alto, CA (US);
BAR-ILAN UNIVERSITY, Ramat Gan, IL;
Abstract
A system for high-resolution high-contrast x-ray ghost diffraction comprises: A) a laboratory x-ray source configured to provide an input beam; B) a diffuser configured to induce intensity fluctuations in the input beam; C) a beam splitter configured to split the input beam into: i) a test arm comprising an object and a single-pixel detector; and ii) a reference arm comprising one of: (a) a multi-pixel detector and (b) a single-pixel detector and an aperture or a scanning slit configured to simulate a one or two dimensional multi-pixel detector; and D) a processor configured to receive output intensity measurements of the detectors in the test arm and the reference arm, to record the output intensity measurements at different rotational positions of the rotating diffuser, to correlate the output intensity measurements, and to use the correlated output measurements to reconstruct a diffraction pattern of the object; wherein the object is placed as close as possible to the beam splitter and the detectors in the test arm and the reference arm are equidistant from the beam splitter.