The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2022

Filed:

Jan. 27, 2021
Applicant:

Zing Semiconductor Corporation, Shanghai, CN;

Inventors:

Weimin Shen, Shanghai, CN;

Youshu Lei, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 15/20 (2006.01); C30B 15/30 (2006.01); C30B 15/10 (2006.01);
U.S. Cl.
CPC ...
C30B 15/30 (2013.01); C30B 15/10 (2013.01);
Abstract

A seeding method for crystal growth comprising: a first seeding step: rotating a crucible with a first rotation speed to grow the crystal to a first length; a second seeding step: gradually increasing the rotation speed of the crucible from the first rotation speed to a second rotation speed, and growing the crystal to a second length; a third seeding step: rotating the crucible with the second rotation speed to growing the crystal to a predicted length. By separating the seeding stage to three steps and gradually increasing the rotation speed in the second step of the crucible, the silicon melt convection is enhanced and the temperature at center of the silicon melt is kept to be not lower than the starting temperature of the seeding. Thereby, the removal of dislocation within the seed crystal can be increased, and the growth problems such as broken or polycrystallization can be prevented.


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