The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Mar. 06, 2018
Strawb Inc., Yokohama, JP;
Kake Educational Institution, Okayama, JP;
National University Corporation Okayama University, Okayama, JP;
Yuichi Imai, Yokohama, JP;
Tatsuyuki Nakatani, Okayama, JP;
Susumu Ozawa, Okayama, JP;
Yasuhiro Fujii, Okayama, JP;
Haruhito Uchida, Okayama, JP;
NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY, Okayama, JP;
Abstract
A film formation method is provided with a step for disposing a non-electroconductive long thin tubein a chamberin which the internal pressure thereof is adjustable, generating a plasma inside the long thin tubein a state in which a starting material gas including a hydrocarbon is supplied, and forming a diamond-like carbon film on an inner wall surface of the long thin tube. The long thin tubeis disposed in the chamberin a state in which a discharge electrodeis disposed in one end part of the long thin tubeand the other end part is open. An alternating-current bias is intermittently applied between the discharge electrodeand a counter electrodeprovided so as to be separated from the long thin tube