The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Jul. 22, 2019
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
Takashi Nagata, Castro Valley, CA (US);
Ting-Chien Teng, Belmont, CA (US);
Nobutaka Magome, Belmont, CA (US);
Bausan Yuan, Belmont, CA (US);
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 36/04 (2006.01); C09K 3/14 (2006.01); B01D 21/02 (2006.01); B01D 37/00 (2006.01); B01F 23/50 (2022.01); C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
C09K 3/1463 (2013.01); B01D 21/02 (2013.01); B01D 37/00 (2013.01); B01F 23/51 (2022.01); C09G 1/02 (2013.01); B01F 23/581 (2022.01);
Abstract
Fluid synthesis system and corresponding method for synthesis of slurry containing abrasive particles. The system and method are configured to substantially segregate the abrasive particles passing through the filter, used at the filtering step of the process, from the sticky components that clog such filter prior to the filtering step of the synthesis process to achieve a sustaining filtration of the slurry as a result of which the filter remains substantially unclogged for the whole predetermined duration of the filtering process.