The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Dec. 18, 2019
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Takashi Fujiwara, Kakegawa, JP;
Atsuhiko Sato, Kakegawa, JP;
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/60 (2006.01); C01B 33/113 (2006.01); C09D 183/10 (2006.01); H01L 21/02 (2006.01); H01L 23/29 (2006.01); C08G 77/54 (2006.01); C08G 77/62 (2006.01); B05D 3/04 (2006.01); B05D 3/02 (2006.01); C08G 77/452 (2006.01);
U.S. Cl.
CPC ...
C08G 77/60 (2013.01); B05D 3/0254 (2013.01); B05D 3/0413 (2013.01); C01B 33/113 (2013.01); C08G 77/54 (2013.01); C08G 77/62 (2013.01); C09D 183/10 (2013.01); H01L 21/0214 (2013.01); H01L 21/02211 (2013.01); H01L 21/02222 (2013.01); H01L 21/02282 (2013.01); H01L 21/02326 (2013.01); H01L 21/02337 (2013.01); H01L 23/296 (2013.01); C08G 77/452 (2013.01);
Abstract
According to the present invention, a siliceous film forming composition, which is capable of filling trenches having narrow widths and high aspect ratios and forming a thick film, can be provided. A siliceous film forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, and (b) a solvent.