The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Sep. 09, 2019
Canon Kabushiki Kaisha, Tokyo, JP;
Yoshihiro Shiode, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint method includes arranging imprint material as droplets on shot region of substrate, bringing the imprint material on part of the shot region into contact with pattern region of mold and then enlarging contact region between the imprint material and the pattern region to whole region of the shot region, and curing the imprint material. in the arranging, in each of local regions located in radial direction from the part of the shot region, the imprint material is arranged such that directional drop density of the imprint material on line parallel to direction orthogonal to the radial direction and with droplets of the imprint material present thereon is smaller than that of the imprint material on line parallel to the radial direction and with droplets of the imprint material present thereon.