The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2022

Filed:

Dec. 19, 2018
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Ryu Kamibaba, Tokyo, JP;

Tetsuo Takahashi, Tokyo, JP;

Akihiko Furukawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/08 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01); H01L 27/06 (2006.01); H01L 21/04 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7397 (2013.01); H01L 21/0465 (2013.01); H01L 27/0629 (2013.01); H01L 29/083 (2013.01); H01L 29/7813 (2013.01);
Abstract

Examples of a semiconductor device includes a transistor region formed in a semiconductor substrate having a first conductivity type drift layer, and a diode region formed to be adjacent to the transistor region in the semiconductor substrate, wherein the diode region has a second conductivity type anode layer formed on the drift layer and a first conductivity type cathode layer formed on the lower side of the drift layer, and the cathode layer has an adjacent region contacting the transistor region, the adjacent region having a depth, from a lower surface of the semiconductor substrate, which becomes shallower toward the transistor region and having first conductivity type impurity concentration which decreases toward the transistor region.


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