The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2022
Filed:
Nov. 29, 2018
Hkc Corporation Limited, Shenzhen, CN;
Shishuai Huang, Shenzhen, CN;
HKC CORPORATION LIMITED, Shenzhen, CN;
Abstract
A method for manufacturing a cross-line structure includes the steps of etching to obtain a first conductive layer, depositing a second conductive material and a photoresist material on the first conductive layer, and removing the part of the photoresist material on a position where a second conductive layer is not required by means of a photomask. The method further includes the steps of etching the second conductive material, obtaining the second conductive layer, and performing compensation on a photomask graphic so that the width of an overlap portion of the second conductive layer with the first conductive layer is greater than or equal to the width of the portion of the second conductive layer that does not overlap the first conductive layer.