The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2022

Filed:

Jan. 14, 2020
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Praveen Joseph, White Plains, NY (US);

Gauri Karve, Cohoes, NY (US);

Yann Mignot, Slingerlands, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0332 (2013.01); H01L 21/3065 (2013.01); H01L 21/3081 (2013.01);
Abstract

A bilayer hardmask is formed on layers, the bilayer hardmask including a first hardmask layer and a second hardmask layer on the first hardmask layer. A first pattern is formed in the second hardmask layer, the first pattern including tapered sidewalls forming a first spacing in the second hardmask layer. A second pattern is formed in the first hardmask layer based on the first pattern, the second pattern comprising vertical sidewalls forming a second spacing in the first hardmask layer, the second spacing being reduced in size from the first spacing.


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