The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2022

Filed:

Jul. 24, 2020
Applicant:

Korea Basic Science Institute, Daejeon, KR;

Inventors:

Ji Young Baek, Cheongju-si, KR;

Myoung Choul Choi, Cheongju-si, KR;

Chang Min Choi, Cheongju-si, KR;

Sang Ju Lee, Gimhae-si, KR;

Boo Ki Min, Ansan-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/16 (2006.01); H01J 49/00 (2006.01); H01J 49/40 (2006.01);
U.S. Cl.
CPC ...
H01J 49/164 (2013.01); H01J 49/0031 (2013.01); H01J 49/0036 (2013.01); H01J 49/40 (2013.01);
Abstract

A mass spectrometry system includes a sample holder provided in a vacuum changer and on which a sample is disposed, an irradiator configured to perform sputtering or ionization on the sample, an analyzer configured to analyze an ionized sample generated from the sample by the irradiator, and a controller configured to control the irradiator or the analyzer and perform a first process and a second process. The first process is to determine position information of materials in the sample by irradiating a laser or ion beam to a portion of the sample, and the second process is to irradiate a laser or ion beam of a first output value to another portion of the sample in a section in which the materials in the sample change and irradiate a laser or ion beam of a second output value in other sections.


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