The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2022
Filed:
Jul. 31, 2018
Nissha Co., Ltd., Kyoto, JP;
Ryomei Omote, Kyoto, JP;
Kazuhiro Nishikawa, Kyoto, JP;
Yoshihiro Sakata, Kyoto, JP;
Takeshi Nishimura, Kyoto, JP;
Takakuni Sunahase, Kyoto, JP;
NISSHA CO., LTD., Kyoto, JP;
Abstract
A method for manufacturing an electrode film includes the steps of laminating a metal layer and a black photoresist layer sequentially on a first main surface of a transparent base material, subjecting the black photoresist layer to patterning in a mesh shape by partially exposing the black photoresist layer and performing development, processing the metal layer into a metal mesh electrode by subjecting the metal layer to etching by using the black photoresist layer subjected to the patterning as an etching mask until the metal layer has a width smaller than a width of a thin wire line constituting a mesh of the black photoresist layer, and covering an upper surface and both side surfaces of a thin wire line constituting a mesh of the metal mesh electrode with the black photoresist layer by heating and softening the black photoresist layer to cause the black photoresist layer softened to flow.