The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2022
Filed:
Jan. 15, 2021
The University of North Carolina AT Chapel Hill, Chapel Hill, NC (US);
Caterina M. Gallippi, Cary, NC (US);
Keita Andrew Yokoyama, Chapel Hill, NC (US);
Md Murad Hossain, Chapel Hill, NC (US);
THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL, Chapel Hill, NC (US);
Abstract
A method for quantitatively measuring a physical characteristic of a material includes performing one or more interrogations of a material sample, each interrogation using a push focal configuration. The method further includes taking measurements of displacement over time of a material sample caused by the one or more interrogations. Each measurement uses an interrogation focal configuration. The method further includes determining a physical characteristic of the material sample based on the measurements of displacement over time of the material sample. According to the method, at least one of the following is true: a tracking focal configuration used for one of the measurements is different from a tracking focal configuration used for another of the measurements; and a push focal configuration used for one of the interrogations is different from a push focal configuration used for another of the interrogations.