The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2022
Filed:
Sep. 28, 2020
SK Innovation Co., Ltd., Seoul, KR;
Nam Kyu Lee, Daejeon, KR;
Sun Young Kim, Daejeon, KR;
Kwang Kuk Lee, Daejeon, KR;
Jin Su Ham, Daejeon, KR;
SK Innovation Co., Ltd., Seoul, KR;
Abstract
The present invention provides a random copolymer including structural units represented by the following Chemical Formulae 1 to 3 for forming a neutral layer for significantly reducing process time and process costs, and promoting directed self-assembly pattern formation of a block copolymer. The present invention further provides a laminate for forming a pattern including a neutral layer having a small thickness variation value due to washing, by including the random copolymer for forming a neutral layer. The present invention further provides a method for forming a pattern capable of stably vertically orienting a block copolymer on a laminate for forming a neutralized pattern.