The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2022
Filed:
May. 28, 2019
Hitachi, Ltd., Tokyo, JP;
Hiroki Miyakawa, Tokyo, JP;
Kotaro Kitamura, Tokyo, JP;
Masayuki Matsuura, Tokyo, JP;
Takanori Oshikiri, Tokyo, JP;
Yusuke Okawa, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
Provided is a reverse osmosis treatment system capable of simultaneously and efficiently recovering energy generated both at brine and permeate sides. The system comprises a branched portion configured to divide second to-be-treated water into third and fourth to-be-treated water; a high-pressure pump configured to pressurize the third to-be-treated water thereby to feed fifth to-be-treated water having a higher pressure than the to-be-treated water before divided; a displacement type of first energy recovery device configured to exchange pressures between the fourth to-be-treated water and brine thus separated by a reverse osmosis treatment device, thereby to produce sixth to-be-treated water having a higher pressure than the fourth one; and a second energy recovery device configured to raise a pressure of the third to-be-treated water located at a downstream side of the branched portion with a pressure of first permeate thus separated by the reverse osmosis treatment device.