The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Feb. 22, 2019
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Yuya Matsubara, Yokkaichi Mie, JP;
Masayuki Kitamura, Yokkaichi Mie, JP;
Atsuko Sakata, Yokkaichi Mie, JP;
Assignee:
KIOXIA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 5/00 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01); C23C 16/32 (2006.01); C23C 16/50 (2006.01); C23C 16/30 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02178 (2013.01); C23C 16/30 (2013.01); C23C 16/32 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01L 21/02274 (2013.01); H01L 21/28556 (2013.01); H01L 21/28568 (2013.01);
Abstract
A substrate processing apparatus includes a chamber to accommodate a substrate. The apparatus includes a stage to support the substrate in the chamber. The apparatus includes an electrode disposed above the stage and containing aluminum. The electrode generates plasma from gas supplied into the chamber to form a first film on the substrate by the plasma. The apparatus further includes a second film formed on a surface of the electrode and containing aluminum and fluorine or containing aluminum and oxygen.