The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Apr. 25, 2018
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03F 7/075 (2006.01); G03F 7/022 (2006.01); G03F 7/031 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0226 (2013.01); G03F 7/031 (2013.01); G03F 7/0757 (2013.01);
Abstract
[Object] To provide a positive type photosensitive composition capable of forming a cured film having high transparency [Means] The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane, a diazonaphthoquinone derivative, an additive having a quaternary ammonium structure and the capability of interacting with the polysiloxane, and a solvent. The polysiloxane and the additive interact with each other before exposure, but they lose the interaction after exposure.
Yoshida, Naofumi. (2022). Positive type photosensitive siloxane composition and cured film formed by using the same (U.S. Patent No. 11392032). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11392032
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile