The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Apr. 28, 2020
Canon Kabushiki Kaisha, Tokyo, JP;
Atsushi Kusaka, Shimotsuke, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
Provided is an imprint apparatus which reduces a shift of a mold from a desired position. The imprint apparatus that forms a pattern of an imprint material on a substrate using a mold includes a correction mechanism which corrects a shape and a magnification of the mold, and a control unit which controls the correction mechanism on the basis of a difference in shape and magnification between the mold and the substrate. The control unit changes a shape coefficient multiplied by a correction amount of the shape to balance a resultant force and a moment on the mold applied by the correction mechanism on the basis of a magnification coefficient, which is a coefficient multiplied by a correction amount of the magnification through closed-loop control.