The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Mar. 17, 2020
Samsung Electronics Co., Ltd., Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-Do, KR;
Abstract
A method of manufacturing a semiconductor device includes forming a lower structure including first repetitive patterns, and forming an upper structure including forming second repetitive patterns to correspond to each of the first repetitive patterns on the lower structure, and the forming second repetitive patterns includes preparing a design layout for the second repetitive patterns, forming a first correction layout including corrected second repetitive patterns by performing optical proximity correction (OPC) on the design layout, forming a second correction layout by performing position correction on the first correction layout to move a position of the corrected second repetitive patterns to correspond to a changed position of the first repetitive patterns according to physical deformation of the lower structure, manufacturing a mask using the second correction layout, and patterning a photoresist layer using the mask.