The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Oct. 26, 2017
Applicant:
National Institute of Advanced Indostiral Science and Technology, Tokyo, JP;
Inventor:
Hideyuki Tanaka, Nagareyama, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/26 (2006.01); G01C 15/00 (2006.01); G01C 15/06 (2006.01); G02B 3/00 (2006.01);
U.S. Cl.
CPC ...
G01B 11/26 (2013.01); G01C 15/002 (2013.01); G01C 15/06 (2013.01); G02B 3/0012 (2013.01);
Abstract
Provided are a marker that enables, within a smaller area size, measurement of the position or the attitude of an object, and a marker manufacturing method. The marker is provided with a variable moire patternthat includes a striped patternwhich is formed on a two-dimensional plane and a lens arrayin which a plurality of lenses are arranged on the two-dimensional plane on which the striped patternis formed.
Tanaka, Hideyuki. (2022). Marker and marker manufacturing method (U.S. Patent No. 11391565). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11391565
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile