The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2022

Filed:

Mar. 02, 2018
Applicant:

Edwards Japan Limited, Chiba, JP;

Inventor:

Takashi Kabasawa, Chiba, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F04D 19/04 (2006.01); F04D 25/06 (2006.01); F04D 27/00 (2006.01); F04D 29/00 (2006.01); F04D 29/70 (2006.01); G01K 13/00 (2021.01);
U.S. Cl.
CPC ...
F04D 19/04 (2013.01); F04D 19/042 (2013.01); F04D 25/0666 (2013.01); F04D 27/001 (2013.01); F04D 29/701 (2013.01); F05D 2270/303 (2013.01); F16C 2360/45 (2013.01); G01K 13/00 (2013.01);
Abstract

A vacuum pump exhaust system and an exhausting method of the vacuum pump supply a purge gas to the vacuum pump such that an amount of the purge gas satisfies one of following conditions: an amount of the purge gas flowing at a higher velocity than a backflow velocity of gas exhausted by the vacuum pump on at least a part of a downstream side of the temperature sensor unit, and an amount of the purge gas having a pressure of one of an intermediate flow and a viscous flow around the temperature sensor unit. The exhaust system further includes a purge gas supply unit capable of controlling a flow rate of purge gas introduced into the vacuum pump. This configuration can prevent process gas from flowing backward so as to change the composition around the temperature sensor unit, thereby accurately measuring the temperature of the rotating portion.


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