The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Feb. 25, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Nitin Deepak, Mumbai, IN;
Suresh Chand Seth, Mumbai, IN;
Prerna Sonthalia Goradia, Mumbai, IN;
Geetika Bajaj, New Delhi, IN;
Darshan Thakare, Thane West, IN;
Jennifer Y. Sun, Mountain View, CA (US);
Gayatri Natu, Mumbai, IN;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of forming a fluorinated metal film is provided. The method includes positioning an object in an atomic layer deposition (ALD) chamber having a processing region, depositing a metal-oxide containing layer on an object using an atomic layer deposition (ALD) process, depositing a metal-fluorine layer on the metal-oxide containing layer using an activated fluorination process, and repeating the depositing the metal-oxide containing layer and the depositing the metal-oxide containing layer until a fluorinated metal film with a predetermined film thickness is formed. The activated fluorination process includes introducing a first flow of a fluorine precursor (FP) to the processing region. The FP includes at least one organofluorine reagent or at least one fluorinated gas.