The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2022

Filed:

Nov. 20, 2020
Applicant:

Tokuyama Corporation, Yamaguchi, JP;

Inventors:

Takafumi Shimoda, Yamaguchi, JP;

Yuki Kikkawa, Yamaguchi, JP;

Tomoaki Sato, Yamaguchi, JP;

Takayuki Negishi, Yamaguchi, JP;

Assignee:

TOKUYAMA CORPORATION, Yamaguchi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 209/68 (2006.01); C11D 3/395 (2006.01); C11D 11/00 (2006.01); B08B 3/08 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C07C 209/68 (2013.01); B08B 3/08 (2013.01); C11D 3/3955 (2013.01); C11D 11/0047 (2013.01); H01L 21/02057 (2013.01);
Abstract

Provided is a method of producing a quaternary alkyl ammonium hypochlorite solution with an excellent storage stability. Specifically, provided is a method of producing a quaternary alkyl ammonium hypochlorite solution, the method including: a preparation step in which a quaternary alkyl ammonium hydroxide solution is prepared and the concentration of amines in the quaternary alkyl ammonium hydroxide solution is set to 20 ppm by mass or less; and a reaction step in which the quaternary alkyl ammonium hydroxide solution is brought into contact with chlorine gas, wherein the concentration of carbon dioxide of a gas phase in the reaction step is 100 ppm by volume or less and the pH of a liquid phase in the reaction step is 10.5 or more.


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