The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Feb. 13, 2017
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Gerrit Scheich, Seligenstadt, DE;
Frank Nuernberg, Aschaffenburg, DE;
Andreas Goetzendorfer, Aschaffenburg, DE;
Nadine Tscholitsch, Hanau, DE;
Bernhard Franz, Gießen, DE;
Ursula Klett, Hanau, DE;
Matthew Donelon, Round Rock, TX (US);
HERAEUS QUARZGLAS GMBH & CO. KG, Hanau, DE;
Abstract
A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 μm.